Studies on the effect of solvents on self-assembled monolayers formed from organophosphonic acids on indium tin oxide.
Identifieur interne : 000A43 ( Main/Exploration ); précédent : 000A42; suivant : 000A44Studies on the effect of solvents on self-assembled monolayers formed from organophosphonic acids on indium tin oxide.
Auteurs : RBID : pubmed:22621243English descriptors
- KwdEn :
- MESH :
- chemical , chemistry : Organophosphonates, Solvents, Tin Compounds.
- Electrochemistry.
Abstract
The preparation of self-assembled monolayers (SAMs) of organophosphonic acids on indium tin oxide (ITO) surfaces from different solvents (triethylamine, ethyl ether, tetrahydofuran (THF), pyridine, acetone, methanol, acetonitrile, dimethyl sulfoxide (DMSO), or water) has been performed with some significant differences observed. Cyclic voltammetry (CV), X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), and contact angle measurement demonstrated that the quality of SAMs depends critically on the choice of solvents. Higher density, more stable monolayers were formed from solvents with low dielectric constants and weak interactions with the ITO. It was concluded low dielectric solvents that were inert to the ITO gave monolayers that were more stable with a higher density of surface bound molecules because higher dielectric constant solvents and solvents that coordinate with the surface disrupted SAM formation.
DOI: 10.1021/la3010129
PubMed: 22621243
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Studies on the effect of solvents on self-assembled monolayers formed from organophosphonic acids on indium tin oxide.</title><author><name sortKey="Chen, Xin" uniqKey="Chen X">Xin Chen</name><affiliation wicri:level="1"><nlm:affiliation>School of Chemistry, University of New South Wales, Sydney NSW 2052, Australia.</nlm:affiliation><country xml:lang="fr">Australie</country><wicri:regionArea>School of Chemistry, University of New South Wales, Sydney NSW 2052</wicri:regionArea></affiliation></author><author><name sortKey="Luais, Erwann" uniqKey="Luais E">Erwann Luais</name></author><author><name sortKey="Darwish, Nadim" uniqKey="Darwish N">Nadim Darwish</name></author><author><name sortKey="Ciampi, Simone" uniqKey="Ciampi S">Simone Ciampi</name></author><author><name sortKey="Thordarson, Pall" uniqKey="Thordarson P">Pall Thordarson</name></author><author><name sortKey="Gooding, J Justin" uniqKey="Gooding J">J Justin Gooding</name></author></titleStmt><publicationStmt><date when="2012">2012</date><idno type="doi">10.1021/la3010129</idno><idno type="RBID">pubmed:22621243</idno><idno type="pmid">22621243</idno><idno type="wicri:Area/Main/Corpus">000C91</idno><idno type="wicri:Area/Main/Curation">000C91</idno><idno type="wicri:Area/Main/Exploration">000A43</idno></publicationStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Electrochemistry</term><term>Organophosphonates (chemistry)</term><term>Solvents (chemistry)</term><term>Tin Compounds (chemistry)</term></keywords><keywords scheme="MESH" type="chemical" qualifier="chemistry" xml:lang="en"><term>Organophosphonates</term><term>Solvents</term><term>Tin Compounds</term></keywords><keywords scheme="MESH" xml:lang="en"><term>Electrochemistry</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">The preparation of self-assembled monolayers (SAMs) of organophosphonic acids on indium tin oxide (ITO) surfaces from different solvents (triethylamine, ethyl ether, tetrahydofuran (THF), pyridine, acetone, methanol, acetonitrile, dimethyl sulfoxide (DMSO), or water) has been performed with some significant differences observed. Cyclic voltammetry (CV), X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), and contact angle measurement demonstrated that the quality of SAMs depends critically on the choice of solvents. Higher density, more stable monolayers were formed from solvents with low dielectric constants and weak interactions with the ITO. It was concluded low dielectric solvents that were inert to the ITO gave monolayers that were more stable with a higher density of surface bound molecules because higher dielectric constant solvents and solvents that coordinate with the surface disrupted SAM formation.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="MEDLINE"><PMID Version="1">22621243</PMID><DateCreated><Year>2012</Year><Month>06</Month><Day>26</Day></DateCreated><DateCompleted><Year>2012</Year><Month>10</Month><Day>31</Day></DateCompleted><DateRevised><Year>2012</Year><Month>11</Month><Day>15</Day></DateRevised><Article PubModel="Print-Electronic"><Journal><ISSN IssnType="Electronic">1520-5827</ISSN><JournalIssue CitedMedium="Internet"><Volume>28</Volume><Issue>25</Issue><PubDate><Year>2012</Year><Month>Jun</Month><Day>26</Day></PubDate></JournalIssue><Title>Langmuir : the ACS journal of surfaces and colloids</Title><ISOAbbreviation>Langmuir</ISOAbbreviation></Journal><ArticleTitle>Studies on the effect of solvents on self-assembled monolayers formed from organophosphonic acids on indium tin oxide.</ArticleTitle><Pagination><MedlinePgn>9487-95</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1021/la3010129</ELocationID><Abstract><AbstractText>The preparation of self-assembled monolayers (SAMs) of organophosphonic acids on indium tin oxide (ITO) surfaces from different solvents (triethylamine, ethyl ether, tetrahydofuran (THF), pyridine, acetone, methanol, acetonitrile, dimethyl sulfoxide (DMSO), or water) has been performed with some significant differences observed. Cyclic voltammetry (CV), X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), and contact angle measurement demonstrated that the quality of SAMs depends critically on the choice of solvents. Higher density, more stable monolayers were formed from solvents with low dielectric constants and weak interactions with the ITO. It was concluded low dielectric solvents that were inert to the ITO gave monolayers that were more stable with a higher density of surface bound molecules because higher dielectric constant solvents and solvents that coordinate with the surface disrupted SAM formation.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Chen</LastName><ForeName>Xin</ForeName><Initials>X</Initials><Affiliation>School of Chemistry, University of New South Wales, Sydney NSW 2052, Australia.</Affiliation></Author><Author ValidYN="Y"><LastName>Luais</LastName><ForeName>Erwann</ForeName><Initials>E</Initials></Author><Author ValidYN="Y"><LastName>Darwish</LastName><ForeName>Nadim</ForeName><Initials>N</Initials></Author><Author ValidYN="Y"><LastName>Ciampi</LastName><ForeName>Simone</ForeName><Initials>S</Initials></Author><Author ValidYN="Y"><LastName>Thordarson</LastName><ForeName>Pall</ForeName><Initials>P</Initials></Author><Author ValidYN="Y"><LastName>Gooding</LastName><ForeName>J Justin</ForeName><Initials>JJ</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType><PublicationType>Research Support, Non-U.S. Gov't</PublicationType></PublicationTypeList><ArticleDate DateType="Electronic"><Year>2012</Year><Month>06</Month><Day>07</Day></ArticleDate></Article><MedlineJournalInfo><Country>United States</Country><MedlineTA>Langmuir</MedlineTA><NlmUniqueID>9882736</NlmUniqueID><ISSNLinking>0743-7463</ISSNLinking></MedlineJournalInfo><ChemicalList><Chemical><RegistryNumber>0</RegistryNumber><NameOfSubstance>Organophosphonates</NameOfSubstance></Chemical><Chemical><RegistryNumber>0</RegistryNumber><NameOfSubstance>Solvents</NameOfSubstance></Chemical><Chemical><RegistryNumber>0</RegistryNumber><NameOfSubstance>Tin Compounds</NameOfSubstance></Chemical><Chemical><RegistryNumber>71243-84-0</RegistryNumber><NameOfSubstance>indium tin oxide</NameOfSubstance></Chemical></ChemicalList><CitationSubset>IM</CitationSubset><MeshHeadingList><MeshHeading><DescriptorName MajorTopicYN="N">Electrochemistry</DescriptorName></MeshHeading><MeshHeading><DescriptorName MajorTopicYN="N">Organophosphonates</DescriptorName><QualifierName MajorTopicYN="Y">chemistry</QualifierName></MeshHeading><MeshHeading><DescriptorName MajorTopicYN="N">Solvents</DescriptorName><QualifierName MajorTopicYN="Y">chemistry</QualifierName></MeshHeading><MeshHeading><DescriptorName MajorTopicYN="N">Tin Compounds</DescriptorName><QualifierName MajorTopicYN="Y">chemistry</QualifierName></MeshHeading></MeshHeadingList></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="aheadofprint"><Year>2012</Year><Month>6</Month><Day>7</Day></PubMedPubDate><PubMedPubDate PubStatus="entrez"><Year>2012</Year><Month>5</Month><Day>25</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2012</Year><Month>5</Month><Day>25</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2012</Year><Month>11</Month><Day>1</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="doi">10.1021/la3010129</ArticleId><ArticleId IdType="pubmed">22621243</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
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